SCK-VTC-600-3HD-LD is a combinatorial plasma sputtering system with three 2“ magnetron sputtering sources and three RF/DC power supplies. Such a sputtering system is capable of co-sputtering up to three different target materials and creates various composition profiles across the substrate (e.g. ternary materials for Li-ion rechargeable battery). This system is also suitable for sequential coating of multiple layer films such as ferroelectric, alloy, semiconductor, ceramic, dielectric, optical, oxide, hard, PTFE, etc.
(factory supply,Support customization, including accessories and consumables, please contact our staff for details.)
Compact Structure | |
Input Power | 220VAC 50/60Hz, single phase 2000W (including pump) |
Source Power | The power source is optional with single DC power source, single RF power source or both DC and RF power source. (Please select it in the option bar) DC source: 500W for coating metallic materials ( below left) Compact 300 RF source for non-conductive materials ( Below right) |
Magnetron Sputtering Head | Three 2" Magnetron Sputtering Heads with water cooling jackets are included ( click picture-left to see detailed specs ) to connect optional power source Head Water Cooling: 10ml/min water flow required |
Vacuum Chamber | Vacuum Chamber: 300 mm Dia x 300 mm height, made of stainless steel Observation Window: 100 mm diameter Hinged type cover on top with air spring sport makes target exchange easy |
Sample Holder | Sample holder size: 140mm dia. for. 4" wafer max Sample holder rotation speed is adjustable: 1 - 20 rpm for uniform coating The holder temperature is adjustable from RT to 500°C Max with accuracy +/- 1.0 °C |
Gas Flow Control
| Two precision digital MFC (mass flow controller) are installed to allow two types of gases to be filled in Flow rate: 200 ml/min max. Flow rate is adjustable on the 6" touch screen control panel |
Vacuum Pump Station | 1.High speed turbo vacuum pump system (made in Germany) is directly installed on the vacuum chamber for max. vacuum level 2.Heavy duty dual stage mechanical pump is connected to turbo pump for faster pump speed 3.Mobile pump station is included and the compact sputtering coater can be put on top of station 4.Max. vacuum level: 10^-6 torr with chamber baking |
Thickness Monitor | 1.One Precision quartz thickness sensor is built into the chamber to monitor coating thickness with accuracy 0.10 Å 2. LED Display Unit outside chamber can: Input material to be coated according to data base included Display total thickness coated and coating speed 3.5 pcs quartz sensors (consumable) are included 4.Water cooling is required |
Overall Dimensions | L1300mm× W660mm× H1200mm |
Net Weight | 160 kg |
Warranty | 2 years limited warranty with lifetime support |
